TAMAPURE-AA Series Lineup
- Each metallic impurity level guaranteed
to be 10 ppt or less.
- TAMAPURE-AA-10 is the further purified
reagent of TAMAPURE-AA-100.
- Open and use in a clean environment of
CLASS 10 or higher.
| Item |
Concentration |
Unit Packing |
| Hydrofluoric Acid (HF) |
38% |
500gr |
| Hydrochloric Acid (HCl) |
20% |
500gr |
| Nitric Acid (HNO3) |
68% |
500gr |
| Nitric Acid (For overseas) |
55% |
500gr |
| Hydrogen Peroxide (H2O2) |
35% |
500gr |
| Ammonia solution (NH3) |
20% |
450gr |
- Each metallic impurity level guaranteed
to be 100 ppt or less.
- Open and use in a clean environment of
CLASS 100 or higher.
| Item |
Concentration |
Unit Packing |
| Hydrofluoric Acid (HF) |
38% |
500gr |
| Hydrochloric Acid (HCl) |
20% |
500gr |
| Hydrochloric Acid (HCl) |
30% |
500gr |
| Nitric Acid (HNO3) |
68% |
500gr |
| Nitric Acid (For overseas) |
55% |
500gr |
| Sulfuric Acid (H2SO4) |
98% |
250gr |
| Perchloric Acid (HClO4) |
70% |
500gr |
| Ammonia solution (NH3) |
20% |
450gr |
| Hydrogen Peroxide (H2O2) |
35% |
500gr |
| Acetic Acid (CH3COOH) |
30% |
500gr |
| Hydrobromic Acid (HBr) |
47% |
500gr |
Ultrapure Water is used for the cleaning
of instruments and containers in trace analysis
and for dilution of samples.
TAMAPURE-AA Ultrapure Water has a metal impurity
of ppt levels or less, and allows you to
obtain more reliable analytical values due
to the minimization of blank values.
- Each metallic impurity level guaranteed
to be 10 ppt or less.
- Open and use in a clean environment of
CLASS 10 or higher.
- Unit Packing: 500 grams
TAMAPURE-AA TMAH
TMAH is the abbreviation of Tetramethyl Ammonium
Hydoxide (chemical formula (CH3)4NOH) and
its aqueous solution is a strong alkali.
In preparation of analytical samples,
it
is very effective in the trace analysis
of
elements that are liable to become
volatile
with acid-digestion. In addition, compared
to conventional alkali digestion using
NaOH
or KOH, the use of TMAH enables more
accurate
determination due to its smaller matrix
effect.
- Each metallic impurity level guaranteed
to be 1000 ppt or less.
- Use after opening in a clean environment
such as a clean room.
- Concentration: 25%
- Unit packing: 500 grams
TAMAPURE-AA SSX and SSR are pre-mixed scanning
solutions for wafer surface analysis. This
analysis process involves sample preparation
using VPD or other methods, taking up into
solution using DADD or other methods. Next
trace metals are measured in the scanning
solution using GFAAS, ICPMS, or TXRF. These
new products were developed to improve the
reliability and efficiency of wafer surface
trace metal analysis.
SSX is a solution of 2%-HF and 2%-H2O2 as
specified by ISO standard. SSR is a solution
of 1%-HF and 3%-H2O2.
We guarantee the metallic impurities below
10ppt for each metal and the reagent concentration
within +/- 20% of the reference value.
(Specification)
TAMAPURE-AA SSX Specification Sheet
TAMAPURE-AA SSR Specification Sheet
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