Products for Semiconductor
and
LCD Manufacturing
With the remarkable development of the semiconductor and liquid crystal industries, the demand for "high purity" in products used at each stage of their manufacturing processes has been steadily increasing.
In response to these customer needs, our company provides high-quality raw materials and products at reasonable prices with stable supply.
We produce a wide range of high-purity chemicals for semiconductor applications, including developers, cleaning solutions, thin-film formation materials, colloidal silica, and high-purity copper plating solutions for semiconductors.
Product Features
Developer
TMAH-based Products
"TMAH" (Tetramethyl ammonium hydroxide) is a high-purity organic strong alkali chemical used as a developer for positive resists in semiconductors and liquid crystal lithography.
Currently, TMAH-based developers are the mainstream in semiconductor and liquid crystal factories. These developers are broadly categorized into two types: those prepared by diluting TMAH concentration and those with additives added to this dilution.
Our company handles both types of developers. We perform synthesis through filling at multiple sites domestically and internationally, using a proprietary manufacturing method that does not involve halide salts in the raw materials.
The additive-containing "AD-10" has excellent wettability on resist surfaces and is compatible with many resists, enabling a wide range of resist selections.
Note: This product is classified as a pharmaceutical external poison.
Choline Aqueous Solution
"Choline" is an organic strong alkali used widely as a semiconductor surface treatment agent and a developer for positive resists in lithography.
While it is strongly alkaline and dissolves well in water and alcohol, it tends to absorb carbon dioxide from the air and convert to choline carbonate without causing precipitation like inorganic alkalis (carbonates). It is a colorless and transparent liquid with a characteristic amine odor, but it is biodegradable and easily decomposed by activated sludge treatment.
This high-purity organic alkali contains almost no alkali metals such as Na or K or other heavy metals and is used as a cleaning and developing solution in semiconductor manufacturing processes. It also contains no anionic impurities.
Thin Film Formation Material (TEOS)
This product contains extremely low levels of metal impurities, moisture, organic impurities, and particles.
Ultrahigh Purity Colloidal Silica
It is used as abrasive grains in CMP slurries, various coating materials, ceramic binders, and more.
Synthesized by the sol-gel method using silicate esters as raw materials.
We offer a variety of products with multiple shapes and particle sizes.
High-Purity Cu Plating Solution and Additives for Semiconductors
Both the base solution and additives can be supplied as a set. Demonstrations and customized additive offerings for customers are also available.
We provide solutions for various applications including:
- Cu Plating Base Solution for Semiconductors
- Cu Plating Additives for Damascene Process
- Cu Plating Additives for Bump and Redistribution Layers
- Cu Plating Additives for TSV (Through-Silicon Via)
Ultra-High-Purity Alkaline Cleaning Solution (TMSC) for Precision Cleaning
"TMSC" is a cleaning liquid ideal for precision cleaning that requires exceptionally high cleanliness.
It is an ultra-high-purity cleaning liquid containing almost no alkali metals such as Na and K, nor other heavy metals. It also contains almost no anionic impurities such as Cl. Therefore, it not only prevents contamination of cleaned objects but also minimizes contamination of cleanrooms by Na or Cl even when used at elevated temperatures. Compared to conventional flammable organic solvents and commercial detergents, it offers superior cleaning performance.
TMSC demonstrates excellent cleaning effects for a broad range of complex contaminants, enabling efficient batch cleaning methods and reducing chemical and pure water consumption. Furthermore, depending on cleaning conditions, effective cleaning can be achieved even at dilution ratios of 20 to 30 times, making it very economical. Its chemical composition is stable and odorless, allowing easy heated cleaning.
It removes organic contamination and exhibits a mild etching effect on many materials such as silicon, glass, and non-ferrous metals, demonstrating excellent effectiveness in removing metallic impurities from surfaces. It is also highly effective in removing organic contamination, such as fingerprints and wax on glass and silicon substrates.
Note: This product is classified as a pharmaceutical external poison.
TMSC is suitable for cleaning the following items:
・Various electronic substrates and parts such as silicon wafers, optical wafers, photomask substrates, optical disk substrates, compact disk substrates, and liquid crystal-related substrates
・Instruments used for ultra-trace analysis sensitive to metal impurities, such as nebulizers for ICP-AES and ICP-MS
・Optical industrial components such as lenses and prisms
・Various quartz instruments like quartz crucibles and quartz tubes
・Precision industrial parts including measuring instrument components and bearings
